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Description
Weekly pore clearing and purifying facial mask for skin types prone to acne and seborrhea. The incorporation of inert grains in the exclusive m.acne complex™ provide the mechanical exfoliating and cell renewal action for optimal control of oily and acne-prone skin types.
Active ingredients
Bexaretinyl complex
Chemical exfoliating retinoid that boosts cell renewal of the pilosebaceous unit.
Kaolin
Exfoliating action and absorption of excess sebum, which improves skin softness.
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Additional information
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